Hamid is a postdoctoral scientist in the Thin‑Film Catalysts and Reactors Group at PVcomB, Helmholtz‑Zentrum Berlin (HZB). With more than ten years of experience in thin‑film process development—particularly in atomic layer deposition (ALD)—he currently focuses on designing and optimizing thin‑film catalysts for Fischer–Tropsch synthesis, employing PECVD, ALD, and PVD technologies within the CARE‑O‑SENE project.
Postdoctural Scientist
Helmholtz-Zentrum Berlin
Hamid’s expertise spans thin‑film technologies for catalysis, chemical sensing, and nanoelectronics, with a strong focus on conformal thin‑film deposition on planar and high‑aspect‑ratio 3D structures using ALD and PE(CVD) to create advanced catalytic materials. He completed his doctoral research at Humboldt‑Universität zu Berlin, where he developed functionalized thin‑films heterostructures for energy and environmental applications, extensively employing ALD alongside conventional synthesis methods. He later worked as a postdoctoral scientist at the Institute of Functional Oxides for Energy‑Efficient IT at HZB.
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